石墨烯 新技术 新工艺
《石墨烯电镀液及应用技术工艺配方精选汇编》
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《石墨烯电镀液及应用技术工艺配方精选汇编》！产品应用，产品配方 生产工艺技术。技术新，环保，涉及面广。内容涵盖技术背景/原理、材料配方比例、制作方法、工艺步骤、结构设计图（部分设备类有），以及发明人名称、地址、邮编、申请日期、专利号、权利要求等详细信息！！！
《石墨烯电镀液及应用技术工艺配方精选汇编》
石墨烯生产技术 配方及应用专辑》
石墨烯作为一种单原子厚的薄层材料，由于具有优异的热稳定性和化学稳定性、化学惰性、对分子的不渗透性、极高的高宽比等独特特性，是理想的抗腐蚀涂层，可以应用于很多方面，将石墨烯直接放在铜、镍表面上还是通过其他方法转换到其他金属表面，都能让金属免遭腐蚀。单层石墨烯通过化学气相沉积（CVD）在铜上生长从而包裹住铜，结果表明，其腐蚀速度比光秃秃的铜慢7倍；通过让多层石墨烯在镍上生长从而包裹住镍，其腐蚀速度比光秃秃的镍慢20多倍。单层石墨烯膜对包括氮在内的标准气体具有不渗透性，以及对盐的不渗透性使其成为防腐蚀涂层的优秀候选材料，在金属防腐领域有巨大的应用潜力。
目前，制备石墨烯防腐材料的方法有很多，如化学气相沉积法、电喷射法、溶胶凝胶法、涂覆法、电泳沉积法等。电泳沉积是一种胶体过程，其中悬浮粒子被一个电场从悬浮介质推动到衬底，相比其他方法而言，电泳沉积法具有装置简单、成本低、操作简便、涂层均匀性好、厚度可控等优势，且电泳沉积法可沉积还原氧化石墨烯在不同规则、复杂的三维金属表面。
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极紫外光刻胶（EUV光刻胶）技术：EUV光刻胶是目前最先进的光刻胶技术之一，主要用于极紫外光刻工艺，能够实现极小的线宽和高分辨率的图形转移，是制造高端芯片的关键材料例如，JSR公司在2011年就与SEMATECH联合开发出用于15nm工艺的化学放大型EUV光刻胶东京应化（TOK）也在EUV光刻胶领域处于领先地位，其在2020年拥有EUV光刻胶51.8%的市占率。
高灵敏度和高分辨率光刻胶技术：通过优化光刻胶的化学配方和结构，提高光刻胶对光的灵敏度和分辨率，从而实现更小的图形尺寸和更高的集成度如Inpria生产的包含氧化锡的EUV光刻胶，具有良好的灵敏度，将EUV的吸收效率提升了4倍，并且可以实现更简单的制造流程和更大的工艺窗口。
多层膜光刻技术：为了进一步提高光刻分辨率，采用多层膜光刻技术，通过在光刻胶层之间增加特殊的膜层，减少光的反射和散射，提高光刻的对比度和分辨率。
本资料是收录涉及《国际光刻胶制造工艺配方精选汇编》最新专利技术资料，资料中包括制造原料、配方、生产工艺、产品性能测试及标准、实际应用效果，技术指标，解决的具体问题等等，是企业提高产品质量和发展新产品的重要、实用、超值和难得的技术资料。
【资料内容】制造工艺及配方
【资料语种】英文
【项目数量】56项
【电子版】1680元（PDF文档 邮件发送）
目录
| 序号 | 项目名称 | 研制单位 |
| 1 | Enhanced Euv Materials, Photoresists And Methods Of Their Use | ROBINSON ALEX P G [GB] JACKSON ED [US] O'CALLAGHAN GREGORY [GB] ROTH JOHN [US] MCCLELLAND ALEXANDRA [GB] LADA TOM [US] POPESCU CARMEN [GB] |
| 2 | Euv Lithography Using Polymer Crystal-Based Reticles | REKHI SANDEEP WALLING THOMAS JOHN FARRELL PICHUMANI PRADEEP SAILAM |
| 3 | Photoresist Composition For Euv, Method For Manufacturing Same, And Method For Forming Photoresist Pattern Using Same | HONG SUKWON [KR] HWANG CHAN CUK [KR] KIM DO WON [KR] BYEON JIN HWAN [KR] AHN JAE BOONG [KR] |
| 4 | Pellicle For Euv Lithography And Method For Manufacturing Pillicle Film Of The Same | PARK CHUL KYUN HONG JU HEE CHOI MUN SU KIM DONG HOI |
| 5 | Pellicle For Euv Lithography | HONG JU-HEE [KR] PARK CHUL-KYUN [KR] CHOI MUN-SU [KR] KIM DONG-HOI [KR] |
| 6 | Method To Reduce Line Edge Roughness For Euv Photoresist Pattern | WANG XIN-KE [CN] SHEN ZE-QING [CN] SINGHA ROY SUSMIT [IN] MALLICK ABHIJIT BASU [US] BHUYAN BHASKAR JYOTI [IN] TANG JIECONG [SG] SUDIJONO JOHN [US] SALY MARK [US] |
| 7 | Enhanced Euv Photoresists And Methods Of Their Use | ROBINSON ALEX P G [GB] JACKSON EDWARD [US] ROTH JOHN [US] LADA TOM [US] O'CALLAGHAN GREG [GB] |
| 8 | Organometallic Tin Clusters As Euv Photoresist | LU FENG [US] |
| 9 | Euv Low Roughness Euv Lithography | WISE RICHARD SHAMMA NADER |
| 10 | Enhanced Euv Photoresist And Methods Of Use Thereof | ROBINSON ALEX P G JACKSON EDWARD ROTH JOHN LADA TOM O 'CALLAGHAN GREG |
| 11 | Pellicle For Euv Lithography | HONG JU HEE JUNG MIN WOOK CHOI MUN SU |
| 12 | Method Of Euv Lithography | CHEN TAI-YU [TW] KHIVSARA SAGAR DEEPAK [IN] CHIEN SHANG-CHIEH [TW] LAM KAI TAK [SG] YU SHENG-KANG [TW] |
| 13 | Euv Composition For Semiconductor Euv Lithography And Method For Semiconductor Euv Lithography Using The Same | LEE GEUN SU [KR] LEE YEONG SEON SEONG YEON HEE KIM SEOK HYUN KIM YOUNG CHAN CHEON JONG HYEON LEE SEUNG HYUK |
| 14 | Pellicle For Euv Lithography Masks And Methods Of Manufacturing Thereof | HSU PEI-CHENG [TW] SUN TING-PI [TW] LEE HSIN-CHANG [TW] |
| 15 | Euv Metal Photoresist As Well As Preparation Method And Application Thereof | WANG SU FANG SHUNONG |
| 16 | Euv Photoresist As Well As Preparation Method And Application Thereof | WANG SU FANG SHUNONG |
| 17 | Euv/Eb Photoresist As Well As Preparation Method And Application Thereof | FANG SHUNONG WANG SU TANG CHEN |
| 18 | Euv Photomask And Manufacturing Method Of The Same | HSU FENG YUAN [TW] SHEN TRAN-HUI [TW] HSU CHING-HSIANG [TW] |
| 19 | Euv Euv Dose Reducing Layers Related Structures And Methods And Systems For Their Manufacture | FATEMEH DAVODI PAUL CHATELAIN CHARLES DEZELAH |
| 20 | Method Of Forming Carbon-Based Spacers For Euv Photoresist Patterns | WANG XINKE SHEN ZEQING ROY SUMEET SINGH MALLIK ABHIJIT BASU BHUYAN BHASKAR JYOTI TANG JIECONG SUDIJONO JOHN SALY MARK |
| 21 | Zirconium-Coated Ultra-Thin, Ultra-Low Density Films For Euv Lithography | LIMA MARCIO D [US] GRAHAM MARY VIOLA [US] UEDA TAKAHIRO [US] |
| 22 | Euv Membrane For Euv Lithography And Manufacturing Method For The Same | YU LAN SEO KYOUNG WON PARK JIN SU YANG SEONG JU HONG SEONG GYU LEE HWA CHOL KIM CHEONG KIM KYOUNG SOO YUN WOO HYUN CHO SANG JIN LEE DONG HOON LEE SO YOON PARK SEONG HWAN KIM YONG SU KANG HONG GU CHOI JAE HYUCK |
| 23 | Euv Euv An Euv Pellicle Frame And An Euv Pellicle Using It | HORIKOSHI JUN [JP] |
| 24 | Pellicle For Euv Lithography | HONG JU HEE PARK CHUL KYUN CHOI MUN SU KIM DONG HOI |
| 25 | Euv The Manufacturing Method Of Pellicle For Euv Photomask Using Reinforeced Graphene Membrane | KIM YONG KI [KR] |
| 26 | Euv The Manufacturing Method Of Pellicle For Protecting Euv Photomask Using Reinforeced Pad | KIM YONG KI [KR] |
| 27 | Euv The Manufacturing Method Of Pellicle For Euv Photomask Using Reinforeced Graphene Membrane | KIM YONG KI [KR] |
| 28 | Implant Into Euv Metal Oxide Photoresist Module To Reduce Euv Dose | PRASAD RAJESH [US] LIN YUNG-CHEN [US] HUANG ZHIYU [US] WANG FENGLIN [US] LANG CHI-I [US] HWANG HOYUNG DAVID [US] AREVALO EDWIN A [US] SHIM KYUHA [US] |
| 29 | Method Of Manufacturing Euv Photo Masks | LEE HSIN-CHANG [TW] HSU PEI-CHENG [TW] LIEN TA-CHENG [TW] WANG TZU YI [TW] |
| 30 | Blankmask And Photomask For Euv Lithography With Backside Conductive Layer | WOO MI KYUNG PARK MIN KYU YANG CHUL KYU |
| 31 | Euv Euvextreme Ultraviolet Mask And Method For Manufacturing The Same | JANG SUNG WOO LEE SUN PYO JUNG EUI HAN |
| 32 | Euv The Manufacturing Method Of Graphene Membrane Pellicle For Extreme Ultra Violet Lithography | KIM YONG KI [KR] |
| 33 | Enhanced Euv Photoresist Including A Core Tris(4-Hydroxyphenyl)Methane Group And Having Improved Sensitivity (Photosensitivity), Resolution (Line Width Roughness), Or Both | ROBINSON ALEX P G [GB] MCCLELLAND ALEXANDRA [GB] O '' CALLAGHAN GREG [GB] JACKSON ED [US] NGUYEN VAN HUY [GB] MELONI FERNANDA [IT] |
| 34 | Phase Shift Blank Mask And Photomask For Euv Lithography | KIM YONG-DAE LEE JONG-HWA YANG CHUL KYU |
| 35 | Methods For Making Euv Patternable Hard Masks | WU CHENGHAO TIMOTHY WILLIAM WEIDMAN KATIE NARDI |
| 36 | Pellicle For An Euv Lithography Mask And A Method Of Manufacturing Thereof | CHAO TZU-ANG [TW] CHENG CHAO-CHING [TW] WANG HAN [TW] |
| 37 | Pellicle For Euv Lithography | HONG JU HEE PARK CHUL KYUN CHOI MUN SU KIM DONG HOI |
| 38 | Reflective Mask Blank For Euv Lithography, Mask Blank For Euv Lithography, And Manufacturing Methods Thereof | AKAGI DAIJIRO [JP] KAWAHARA HIROTOMO [JP] UNO TOSHIYUKI [JP] ISHIKAWA ICHIRO [JP] SAKAKI KENICHI [JP] |
| 39 | Thin Film For Euv Lithography Mask And Method Of Manufacturing Same | XU BEICHENG LI WEIHAO LI HUANLING LI XINCHANG LIN JINXIANG |
| 40 | Euv Light Generation System And Production Method Of Electronic Device | NISHIMURA YUICHI UENO YOSHIFUMI |
| 41 | Thin Film For Euv Lithography Mask And Method Of Manufacturing Same | SON JUNG-PIL XU BEICHENG LI XINCHANG |
| 42 | Euv Euv Euv Euv-Level Substrate Euv Mask Base Euv Mask And Method Of Manufacturing Same | JI MINGHUA DONG YUHU HUANG ZAOHONG |
| 43 | Euv Photomask And Manufacturing Method Thereof | XUE WENZHANG LIAN DACHENG LI XINCHANG |
| 44 | Pellicle For Euv Lithography With Cnt Film And Method For Forming Film Of The Same | CHOI MUN SU HONG JU HEE PARK CHUL KYUN KIM DONG HOI |
| 45 | Detection Method Of Euv Pellicle Status | LIU YEN-HAO [TW] WANG SHAO-HUA [TW] ZHANG ZHENG-HAO [TW] LIN FAN-CHI [TW] KUO CHUEH-CHI [TW] CHEN LI-JUI [TW] LIU HENG-HSIN [TW] |
| 46 | Euv The Forming Method Of Graphene For Pellicle Membrane Of Extreme Ultra Violet Lithography | KIM YONG KI [KR] |
| 47 | Euv The Forming Method Of Graphene Membrane To Have Capping Layer For Pellicle Of Extreme Ultra Violet Lithography | KIM YONG KI [KR] |
| 48 | Euv Euv Reflection-Type Mask Blank For Euv Lithography Reflection-Type Mask For Euv Lithography And Manufacturing Methods Therefor | AKAGI DAIJIRO [JP] KAWAHARA HIROTOMO [JP] SASAKI KENICHI [JP] ISHIKAWA ICHIRO [JP] UNO TOSHIYUKI [JP] |
| 49 | Extreme Ultraviolet Lithography Method And Euv Photomask | LEE CHIEN-MIN [TW] CHEN YEN-LIANG [TW] LIN SHY-JAY [TW] CHEN LEE-FENG [TW] TAI KUO LUN [TW] |
| 50 | Phase Shift Blankmask And Photomask For Euv Lithography | PARK MIN-KWANG [KR] PARK MIN-KYU [KR] WOO MI-KYUNG [KR] YANG CHUL-KYU [KR] KIM YONG-DAE [KR] |
| 51 | Blankmask For Euv Lithography With Absorbing Film, And Photomask Fabricated With The Same | PARK MIN-KYU [KR] WOO MI-KYUNG [KR] PARK MIN-KWANG [KR] YANG CHUL-KYU [KR] |
| 52 | Membrane For Euv Lithography | HOUWELING ZOMER SILVESTER [NL] GHIASI KABIRI MAHNAZ [NL] GIESBERS ADRIANUS JOHANNES MARIA [NL] BERGERS LAMBERTUS IDRIS JOHANNES CATHARINA [NL] |
| 53 | Preferential Infiltration In Lithographic Process Flow For Euv Car Resist | ALVA GABRIELA [US] HAN ZHEN-XING [CN] SACHAN MADHUR [IN] LANG CHI-I [US] ZHOU LIN [CN] LIU LEQUN [US] KAZEM NASRIN [US] |
| 54 | Enhanced Ultra-Thin, Ultra-Low Density Films For Euv Lithography And Method Of Producing Thereof | LIMA MARCIO D [US] UEDA TAKAHIRO [US] |
| 55 | Pellicle For An Euv Lithography Mask And A Method Of Manufacturing Thereof | LIN YUN-YUE [TW] |
| 56 | Methods And Related Systems For Depositing Euv Sensitive Films | PATEL KISHAN ASHOKBHAI [IN] TOMCZAK YOANN [FR] DEZELAH CHARLES [US] ZYULKOV IVAN [RU] DE ROEST DAVID KURT [BE] GIVENS MICHAEL [US] PIUMI DANIELE [IT] |
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