| 序号 | 项目名称 | 研制单位 |
| 1 | Enhanced Euv Materials, Photoresists And Methods Of Their Use | ROBINSON ALEX P G [GB]
JACKSON ED [US]
O'CALLAGHAN GREGORY [GB]
ROTH JOHN [US]
MCCLELLAND ALEXANDRA [GB]
LADA TOM [US]
POPESCU CARMEN [GB]
|
| 2 | Euv Lithography Using Polymer Crystal-Based Reticles | REKHI SANDEEP
WALLING THOMAS JOHN FARRELL
PICHUMANI PRADEEP SAILAM
|
| 3 | Photoresist Composition For Euv, Method For Manufacturing Same, And Method For Forming Photoresist Pattern Using Same | HONG SUKWON [KR]
HWANG CHAN CUK [KR]
KIM DO WON [KR]
BYEON JIN HWAN [KR]
AHN JAE BOONG [KR]
|
| 4 | Pellicle For Euv Lithography And Method For Manufacturing Pillicle Film Of The Same | PARK CHUL KYUN
HONG JU HEE
CHOI MUN SU
KIM DONG HOI
|
| 5 | Pellicle For Euv Lithography | HONG JU-HEE [KR]
PARK CHUL-KYUN [KR]
CHOI MUN-SU [KR]
KIM DONG-HOI [KR]
|
| 6 | Method To Reduce Line Edge Roughness For Euv Photoresist Pattern | WANG XIN-KE [CN]
SHEN ZE-QING [CN]
SINGHA ROY SUSMIT [IN]
MALLICK ABHIJIT BASU [US]
BHUYAN BHASKAR JYOTI [IN]
TANG JIECONG [SG]
SUDIJONO JOHN [US]
SALY MARK [US]
|
| 7 | Enhanced Euv Photoresists And Methods Of Their Use | ROBINSON ALEX P G [GB]
JACKSON EDWARD [US]
ROTH JOHN [US]
LADA TOM [US]
O'CALLAGHAN GREG [GB]
|
| 8 | Organometallic Tin Clusters As Euv Photoresist | LU FENG [US]
|
| 9 | Euv Low Roughness Euv Lithography | WISE RICHARD
SHAMMA NADER
|
| 10 | Enhanced Euv Photoresist And Methods Of Use Thereof | ROBINSON ALEX P G
JACKSON EDWARD
ROTH JOHN
LADA TOM
O 'CALLAGHAN GREG
|
| 11 | Pellicle For Euv Lithography | HONG JU HEE
JUNG MIN WOOK
CHOI MUN SU
|
| 12 | Method Of Euv Lithography | CHEN TAI-YU [TW]
KHIVSARA SAGAR DEEPAK [IN]
CHIEN SHANG-CHIEH [TW]
LAM KAI TAK [SG]
YU SHENG-KANG [TW]
|
| 13 | Euv Composition For Semiconductor Euv Lithography And Method For Semiconductor Euv Lithography Using The Same | LEE GEUN SU [KR]
LEE YEONG SEON
SEONG YEON HEE
KIM SEOK HYUN
KIM YOUNG CHAN
CHEON JONG HYEON
LEE SEUNG HYUK
|
| 14 | Pellicle For Euv Lithography Masks And Methods Of Manufacturing Thereof | HSU PEI-CHENG [TW]
SUN TING-PI [TW]
LEE HSIN-CHANG [TW]
|
| 15 | Euv Metal Photoresist As Well As Preparation Method And Application Thereof | WANG SU
FANG SHUNONG
|
| 16 | Euv Photoresist As Well As Preparation Method And Application Thereof | WANG SU
FANG SHUNONG
|
| 17 | Euv/Eb Photoresist As Well As Preparation Method And Application Thereof | FANG SHUNONG
WANG SU
TANG CHEN
|
| 18 | Euv Photomask And Manufacturing Method Of The Same | HSU FENG YUAN [TW]
SHEN TRAN-HUI [TW]
HSU CHING-HSIANG [TW]
|
| 19 | Euv Euv Dose Reducing Layers Related Structures And Methods And Systems For Their Manufacture | FATEMEH DAVODI
PAUL CHATELAIN
CHARLES DEZELAH
|
| 20 | Method Of Forming Carbon-Based Spacers For Euv Photoresist Patterns | WANG XINKE
SHEN ZEQING
ROY SUMEET SINGH
MALLIK ABHIJIT BASU
BHUYAN BHASKAR JYOTI
TANG JIECONG
SUDIJONO JOHN
SALY MARK
|
| 21 | Zirconium-Coated Ultra-Thin, Ultra-Low Density Films For Euv Lithography | LIMA MARCIO D [US]
GRAHAM MARY VIOLA [US]
UEDA TAKAHIRO [US]
|
| 22 | Euv Membrane For Euv Lithography And Manufacturing Method For The Same | YU LAN
SEO KYOUNG WON
PARK JIN SU
YANG SEONG JU
HONG SEONG GYU
LEE HWA CHOL
KIM CHEONG
KIM KYOUNG SOO
YUN WOO HYUN
CHO SANG JIN
LEE DONG HOON
LEE SO YOON
PARK SEONG HWAN
KIM YONG SU
KANG HONG GU
CHOI JAE HYUCK
|
| 23 | Euv Euv An Euv Pellicle Frame And An Euv Pellicle Using It | HORIKOSHI JUN [JP]
|
| 24 | Pellicle For Euv Lithography | HONG JU HEE
PARK CHUL KYUN
CHOI MUN SU
KIM DONG HOI
|
| 25 | Euv The Manufacturing Method Of Pellicle For Euv Photomask Using Reinforeced Graphene Membrane | KIM YONG KI [KR]
|
| 26 | Euv The Manufacturing Method Of Pellicle For Protecting Euv Photomask Using Reinforeced Pad | KIM YONG KI [KR]
|
| 27 | Euv The Manufacturing Method Of Pellicle For Euv Photomask Using Reinforeced Graphene Membrane | KIM YONG KI [KR]
|
| 28 | Implant Into Euv Metal Oxide Photoresist Module To Reduce Euv Dose | PRASAD RAJESH [US]
LIN YUNG-CHEN [US]
HUANG ZHIYU [US]
WANG FENGLIN [US]
LANG CHI-I [US]
HWANG HOYUNG DAVID [US]
AREVALO EDWIN A [US]
SHIM KYUHA [US]
|
| 29 | Method Of Manufacturing Euv Photo Masks | LEE HSIN-CHANG [TW]
HSU PEI-CHENG [TW]
LIEN TA-CHENG [TW]
WANG TZU YI [TW]
|
| 30 | Blankmask And Photomask For Euv Lithography With Backside Conductive Layer | WOO MI KYUNG
PARK MIN KYU
YANG CHUL KYU
|
| 31 | Euv Euvextreme Ultraviolet Mask And Method For Manufacturing The Same | JANG SUNG WOO
LEE SUN PYO
JUNG EUI HAN
|
| 32 | Euv The Manufacturing Method Of Graphene Membrane Pellicle For Extreme Ultra Violet Lithography | KIM YONG KI [KR]
|
| 33 | Enhanced Euv Photoresist Including A Core Tris(4-Hydroxyphenyl)Methane Group And Having Improved Sensitivity (Photosensitivity), Resolution (Line Width Roughness), Or Both | ROBINSON ALEX P G [GB]
MCCLELLAND ALEXANDRA [GB]
O '' CALLAGHAN GREG [GB]
JACKSON ED [US]
NGUYEN VAN HUY [GB]
MELONI FERNANDA [IT]
|
| 34 | Phase Shift Blank Mask And Photomask For Euv Lithography | KIM YONG-DAE
LEE JONG-HWA
YANG CHUL KYU
|
| 35 | Methods For Making Euv Patternable Hard Masks | WU CHENGHAO
TIMOTHY WILLIAM WEIDMAN
KATIE NARDI
|
| 36 | Pellicle For An Euv Lithography Mask And A Method Of Manufacturing Thereof | CHAO TZU-ANG [TW]
CHENG CHAO-CHING [TW]
WANG HAN [TW]
|
| 37 | Pellicle For Euv Lithography | HONG JU HEE
PARK CHUL KYUN
CHOI MUN SU
KIM DONG HOI
|
| 38 | Reflective Mask Blank For Euv Lithography, Mask Blank For Euv Lithography, And Manufacturing Methods Thereof | AKAGI DAIJIRO [JP]
KAWAHARA HIROTOMO [JP]
UNO TOSHIYUKI [JP]
ISHIKAWA ICHIRO [JP]
SAKAKI KENICHI [JP]
|
| 39 | Thin Film For Euv Lithography Mask And Method Of Manufacturing Same | XU BEICHENG
LI WEIHAO
LI HUANLING
LI XINCHANG
LIN JINXIANG
|
| 40 | Euv Light Generation System And Production Method Of Electronic Device | NISHIMURA YUICHI
UENO YOSHIFUMI
|
| 41 | Thin Film For Euv Lithography Mask And Method Of Manufacturing Same | SON JUNG-PIL
XU BEICHENG
LI XINCHANG
|
| 42 | Euv Euv Euv Euv-Level Substrate Euv Mask Base Euv Mask And Method Of Manufacturing Same | JI MINGHUA
DONG YUHU
HUANG ZAOHONG
|
| 43 | Euv Photomask And Manufacturing Method Thereof | XUE WENZHANG
LIAN DACHENG
LI XINCHANG
|
| 44 | Pellicle For Euv Lithography With Cnt Film And Method For Forming Film Of The Same | CHOI MUN SU
HONG JU HEE
PARK CHUL KYUN
KIM DONG HOI
|
| 45 | Detection Method Of Euv Pellicle Status | LIU YEN-HAO [TW]
WANG SHAO-HUA [TW]
ZHANG ZHENG-HAO [TW]
LIN FAN-CHI [TW]
KUO CHUEH-CHI [TW]
CHEN LI-JUI [TW]
LIU HENG-HSIN [TW]
|
| 46 | Euv The Forming Method Of Graphene For Pellicle Membrane Of Extreme Ultra Violet Lithography | KIM YONG KI [KR]
|
| 47 | Euv The Forming Method Of Graphene Membrane To Have Capping Layer For Pellicle Of Extreme Ultra Violet Lithography | KIM YONG KI [KR]
|
| 48 | Euv Euv Reflection-Type Mask Blank For Euv Lithography Reflection-Type Mask For Euv Lithography And Manufacturing Methods Therefor | AKAGI DAIJIRO [JP]
KAWAHARA HIROTOMO [JP]
SASAKI KENICHI [JP]
ISHIKAWA ICHIRO [JP]
UNO TOSHIYUKI [JP]
|
| 49 | Extreme Ultraviolet Lithography Method And Euv Photomask | LEE CHIEN-MIN [TW]
CHEN YEN-LIANG [TW]
LIN SHY-JAY [TW]
CHEN LEE-FENG [TW]
TAI KUO LUN [TW]
|
| 50 | Phase Shift Blankmask And Photomask For Euv Lithography | PARK MIN-KWANG [KR]
PARK MIN-KYU [KR]
WOO MI-KYUNG [KR]
YANG CHUL-KYU [KR]
KIM YONG-DAE [KR]
|
| 51 | Blankmask For Euv Lithography With Absorbing Film, And Photomask Fabricated With The Same | PARK MIN-KYU [KR]
WOO MI-KYUNG [KR]
PARK MIN-KWANG [KR]
YANG CHUL-KYU [KR]
|
| 52 | Membrane For Euv Lithography | HOUWELING ZOMER SILVESTER [NL]
GHIASI KABIRI MAHNAZ [NL]
GIESBERS ADRIANUS JOHANNES MARIA [NL]
BERGERS LAMBERTUS IDRIS JOHANNES CATHARINA [NL]
|
| 53 | Preferential Infiltration In Lithographic Process Flow For Euv Car Resist | ALVA GABRIELA [US]
HAN ZHEN-XING [CN]
SACHAN MADHUR [IN]
LANG CHI-I [US]
ZHOU LIN [CN]
LIU LEQUN [US]
KAZEM NASRIN [US]
|
| 54 | Enhanced Ultra-Thin, Ultra-Low Density Films For Euv Lithography And Method Of Producing Thereof | LIMA MARCIO D [US]
UEDA TAKAHIRO [US]
|
| 55 | Pellicle For An Euv Lithography Mask And A Method Of Manufacturing Thereof | LIN YUN-YUE [TW]
|
| 56 | Methods And Related Systems For Depositing Euv Sensitive Films | PATEL KISHAN ASHOKBHAI [IN]
TOMCZAK YOANN [FR]
DEZELAH CHARLES [US]
ZYULKOV IVAN [RU]
DE ROEST DAVID KURT [BE]
GIVENS MICHAEL [US]
PIUMI DANIELE [IT]
|
